The current status of trademark application 848629 for UltraFount H is Registered.
The trademark information displayed on this page is public information and is provided for informational purposes only. This information may be incomplete, inaccurate, or outdated, and IndiaFilings does not guarantee its accuracy. IndiaFilings is an independent platform and is not associated, affiliated, or connected with any trademark listed in this database. We do not represent or speak on behalf of any such trademark. If you are trying to contact a specific trademark, please use their official channels. IndiaFilings cannot assist with queries directed at other companies.
| Application Number | 848629 |
| Trademark Status | Registered |
| Trademark Class | 1 |
| Application Date | 1999-03-30 |
| Proprietor Name | (1) TECHNOVA IMAGING SYSTEMS (P) LTD.Body Incorporate |
| Appropriate Office | MUMBAI |
| State | MAHARASHTRA |
| Trademark Type | WORD |
| User Details | 01/01/1990 |
| Goods And Services Details | [CLASS : 1] CHEMICAL PRODUCTS FOR INDUSTRIAL PURPOSES, CHEMICAL PRODUCTS FOR PRINTING PHOTOGRAPHIC PLATES, ALUMINIUM PHOTOSENSITIVE PLATES, COLOUR PHOTOGRAPHIC PLATES, FERROTYPE PHOTOGRAPHIC PLATES, CHEMICAL COMPOSITIONS FOR ABSORBING MOISTURE, CHEMICAL PREPARATIONS FOR PHOTOGRAPHY, COMPOUNDS OF CHEMICAL PRODUCTS FOR DISTRIBUTING, PRINTING INKS, PHOTOGRAPHIC DEVELOPING PREPARATIONS AND SUBSTANCES, GALLATE DEVELOPER, GUMS AND ADHESIVE FOR INDUSTRIAL USE OR MANUFACTURING PROCESS, SCUM REMOVERS, ACID-PROOF SENSITIZES USED IN PHOTOGRAPHY SENSITIZED PAPER, FILMS AND CLOTH, PRESERVATIVES INCLUDED IN CLASS1, CHEMICALS FOR POSITIVE WORKING ACID-DEVELOPMENT DEEP-ETCH PLATEMAKING, CHEMICALS FOR NEGATIVE- WORKING WIPE-ON PLATEMAKING, CHEMICALS FOR POSITIVE-WORKING WATER-DEVELOPMENT DEEP-ETCH PLATEMAKING, PRESSROOM CHEMICALS, FOUNTAIN SOLUTIONS WASHES USED IN PRINTING INDUSTRY, PRE-SENSITIZED CHEMICALS, INCLUDED IN CLASS 1.ConditionsREGISTRATION OF THIS TRADE MARK SHALL GIVE NO RIGHT TO THE EXCLUSIVE USE OF THE LETTER "H". |
Common questions about UltraFount H.